STERLING, Va., Nov. 18 /PRNewswire/ -- 4Wave Inc. has been issued a patent on its innovative multi-filter chip, a product that will enable deployment of 10-Gigabit Ethernet in metropolitan networks. U.S. Patent No. 6,819,871, titled "Multi-Channel Optical Filter and Multiplexer Formed From Stacks of Thin-Film Layers," is the 13th issued patent in the company's rapidly expanding intellectual property portfolio. This portfolio covers both the product itself -- the multi-filter chip -- and the technology used to manufacture it. This technology, Biased-Target Deposition (BTD), is a hybrid between ion beam deposition and conventional sputter deposition that combines the best of each technique and is uniquely suited to demanding applications requiring atomically engineered thin films. 4Wave has two additional patents pending. "This latest patent is a major achievement for 4Wave as we move forward in developing the first prototypes of the multi-filter chip and look ahead to our commercialization strategy," said 4Wave President Sami Antrazi. Compared to today's products, 4Wave's multi-filter chip will be 250 times smaller, be far more reliable and fully compliant with IEEE standards for 10- Gigabit Ethernet transceivers. 4Wave is currently developing prototypes of the multi-filter chip with support from a $2 million grant from the National Institute of Standards and Technology's Advanced Technology Program. A key advantage of 4Wave's multi-filter chip is that it makes it possible to deploy 10-Gigabit Ethernet on already installed multi-mode fiber in local area networks, wide area networks, and metro access. It eliminates the need to install expensive, cumbersome electronics or to replace existing multi-mode fiber, offering a unique, cost-effective solution for the next generation of optical networks. About 4Wave Inc. 4Wave is the premier developer of atomic layer engineering techniques through ion beam processing innovations used to manufacture a wide array of miniature optical components. 4Wave's expertise in ion beam and plasma processing systems, ion/electron/plasma sources, and in-situ process monitors for the etching and deposition of thin films has resulted in the development of the Biased Target Deposition (BTD) technique. BTD is uniquely suited to demanding nanotechnology advancements in optical, semiconductor and magnetic device industries. http://www.4waveinc.com
SOURCE 4Wave Inc.