Energetiq Unveils High Power DUV Light Source at SEMICON West
WOBURN, Mass., June 26 /PRNewswire/ -- Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for use in advanced technology applications, will introduce its newest light innovation, the Saturn(TM) DUV (Deep Ultra Violet) Lamp Subsystem, at the Emerging Technologies and Markets TechXPOT in San Francisco at SEMICON(R) West 2007. The Saturn lamp subsystem is an electrodeless high intensity DUV light source that operates in the wavelength range from 400nm down to 170nm to provide energy for photoprocessing and cleaning applications. Short-wavelength light is ideal for thin-film and surface processes because it avoids electrical charge or heating damage to the wafer or substrate. "We're excited to showcase our latest technology advancement at the TechXPOT during SEMICON West," said Paul Blackborow, CEO of Energetiq. "Building upon our expertise in developing the industry's most reliable EUV light source, Energetiq now offers a DUV source that provides the highest power density available today for uniform illumination across a 300mm wafer or substrate. Using our proprietary inductive coupling technology, the Saturn subsystem achieves a maximum output of DUV light at wavelengths down to 170nm- reducing processing time and significantly lowering cost of ownership." The Saturn subsystem is packaged in a compact housing for easy integration into process tools. It features an integrated power supply, internal water cooling, and recirculating nitrogen cooling to avoid toxic ozone production. The toroidal bulb inside the lamp is electrodeless, thereby eliminating contamination from electrode debris and prolonging lamp life. The low temperature of the bulb minimizes wafer or substrate heating, allowing greater process flexibility. The new Saturn DUV lamp subsystem will be displayed at the Energetiq booth, T15, in the Moscone Center West Hall Level 2 at SEMICON West, July 17-19, 2007. About Energetiq Technology, Inc. Energetiq, based in Woburn, Massachusetts, was founded in March 2004 with a mission to be the preeminent developer and manufacturer of short-wavelength light sources for use in the analysis and fabrication of nano-scale structures and products. Members of the Energetiq team have been responsible for developing many high power plasma sources that run daily in semiconductor fabrication facilities around the world. Energetiq's goal is to leverage this expertise to develop novel, cost-effective, short-wavelength light sources that enable the production of next generation devices. The company's products cover the Deep Ultraviolet (DUV), Extreme Ultraviolet (EUV) and Soft X-Ray (SXR) wavelength range from 400nm to 1nm (nanometer) and can be used in lithography, metrology, inspection, resist and thin-film processing and R&D applications. For more information, visit http://www.energetiq.com.
SOURCE Energetiq Technology, Inc.
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