Energetiq Unveils High Power DUV Light Source at SEMICON West

Jun 26, 2007, 01:00 ET from Energetiq Technology, Inc.

    WOBURN, Mass., June 26 /PRNewswire/ -- Energetiq Technology, Inc., a
 developer and manufacturer of specialized short-wavelength light products
 for use in advanced technology applications, will introduce its newest
 light innovation, the Saturn(TM) DUV (Deep Ultra Violet) Lamp Subsystem, at
 the Emerging Technologies and Markets TechXPOT in San Francisco at
 SEMICON(R) West 2007. The Saturn lamp subsystem is an electrodeless high
 intensity DUV light source that operates in the wavelength range from 400nm
 down to 170nm to provide energy for photoprocessing and cleaning
 applications. Short-wavelength light is ideal for thin-film and surface
 processes because it avoids electrical charge or heating damage to the
 wafer or substrate.
     "We're excited to showcase our latest technology advancement at the
 TechXPOT during SEMICON West," said Paul Blackborow, CEO of Energetiq.
 "Building upon our expertise in developing the industry's most reliable EUV
 light source, Energetiq now offers a DUV source that provides the highest
 power density available today for uniform illumination across a 300mm wafer
 or substrate. Using our proprietary inductive coupling technology, the
 Saturn subsystem achieves a maximum output of DUV light at wavelengths down
 to 170nm- reducing processing time and significantly lowering cost of
 ownership." The Saturn subsystem is packaged in a compact housing for easy
 integration into process tools. It features an integrated power supply,
 internal water cooling, and recirculating nitrogen cooling to avoid toxic
 ozone production. The toroidal bulb inside the lamp is electrodeless,
 thereby eliminating contamination from electrode debris and prolonging lamp
 life. The low temperature of the bulb minimizes wafer or substrate heating,
 allowing greater process flexibility.
     The new Saturn DUV lamp subsystem will be displayed at the Energetiq
 booth, T15, in the Moscone Center West Hall Level 2 at SEMICON West, July
 17-19, 2007.
     About Energetiq Technology, Inc.
     Energetiq, based in Woburn, Massachusetts, was founded in March 2004
 with a mission to be the preeminent developer and manufacturer of
 short-wavelength light sources for use in the analysis and fabrication of
 nano-scale structures and products. Members of the Energetiq team have been
 responsible for developing many high power plasma sources that run daily in
 semiconductor fabrication facilities around the world. Energetiq's goal is
 to leverage this expertise to develop novel, cost-effective,
 short-wavelength light sources that enable the production of next
 generation devices. The company's products cover the Deep Ultraviolet
 (DUV), Extreme Ultraviolet (EUV) and Soft X-Ray (SXR) wavelength range from
 400nm to 1nm (nanometer) and can be used in lithography, metrology,
 inspection, resist and thin-film processing and R&D applications. For more
 information, visit http://www.energetiq.com.

SOURCE Energetiq Technology, Inc.