EUV Technology Awarded 'Outstanding Contribution Award' from EUV Litho Inc.
MARTINEZ, Calif., Sept. 11, 2012 /PRNewswire-iReach/ -- EUV Technology has been awarded the 'Outstanding Contribution Award' by EUV Litho, Inc. at the 2012 International Workshop on Extreme Ultraviolet (EUV) Lithography. The award was given for the company's 15 years of intellectual and technological achievements in developing the infrastructure of EUV lithography. Cutting-edge EUV lithography helps to drive the natural progression of semiconductor technology advancement known as "Moore's Law", which observes that the average number of transistors packed on a chip doubles every 18 months
The International Workshop on EUV lithography is an annual meeting presented by EUV Litho Inc. from Austin, Texas. The workshop brings together the leading minds in the field of EUV lithography. The workshop took place in Maui, Hawaii in early June, during which EUV Technology was presented with the award for 'Outstanding Contribution'.
Touted as the world leader in EUV metrology equipment, EUV Technology has successfully developed and delivered products in nearly every step of the EUV lithography inspection process. Their customers have included institutions such as Lawrence Livermore National Laboratory, SEMATECH, IMEC, and major semiconductor manufacturers throughout the world. For these achievements in developing products to support the infrastructure involved in the process of EUV lithography, EUV Technology was presented with this award from the symposium. Ivan Pollentier of IMEC, Belgium, had this to say in support of the award, "EUV Technology is advancing the development towards a professional tool with an eye for user friendliness that enables us to do measurements in ideal circumstances. In particular we like very much the creativity of their designs based on logical thinking."
Rupert Perera, the President of EUV Technology, was presented with the award and had this to say, "We are honored to receive this recognition from the EUV community. Our aim has always been to produce high quality EUV Metrology tools that bring this technology a step closer to high-volume manufacturing, so this award is especially validating."
About EUV Technology
Started in 1997, EUV Technology located in Martinez, CA is the world's leading manufacturer of metrology equipment for EUV lithography. EUV Technology provides many of the principal players in the semiconductor industry with EUV Reflectometers, EUV resist out-gassing measurement tools, and hydrogen radical cleaners. In 2005, EUV Technology's EUV Reflectometer was awarded Research and Development Magazine's "R&D 100 Award". EUV Technology's SuMMIT Software Division also develops and markets SEM analysis software for the lithography community. More information about the company, products, and technology are available at www.euvl.com.
SOURCE EUV Technology
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