HILLSBORO, Ore, July 31 /PRNewswire-FirstCall/ -- FEI Company (Nasdaq:
FEIC) today announced that scientists at its NanoPort(TM) in Europe have
broken another image resolution barrier with the world's most advanced
commercially-available microscope, the Titan(TM) 80-300 corrected S/TEM.
For the first time ever, directly interpretable TEM images with atomic
resolution better than 1.4 Angstrom were obtained at the very low operating
voltage of 80kV.
The result was welcomed by some of the world's leading research centers
as an important milestone in nanocharacterization as now even light element
materials such as carbon nanotubes and graphene can be imaged artifact-free
and with high contrast while having highest lateral resolution.
Direct atomic resolution at 80kV was obtained for various classes of
materials: gold nanoparticles, silicon and single wall carbon nanotubes.
The smallest atomic distance resolved was the well-known silicon dumbbell
distance of 1.36 Angstrom. These new findings will be presented in a
scientific presentation at the Microscopy & Microanalysis 2006 conference
being held this week in Chicago.
"I am pleased to see this proof of the stability of the Titan column at
the low-voltage end of its range. This is good news for the TEAM project,
which specifically demands unprecedented resolution over the whole
operating range of 80 to 300kV to meet a spectrum of scientific challenges.
I consider this a significant milestone for the TEAM/FEI collaboration,"
commented Ulrich Dahmen, TEAM Project Director from the National Center for
Electron Microscopy in Berkeley, California.
"With their resolving power at an accelerating voltage of only 80 kV,
the Titan instruments will allow us to get much deeper and more reliable
insight in materials classes previously excluded from high-resolution
analysis due to their beam-sensitivity. This will include nanomaterials
composed of light elements in both hard and soft matter, which can now be
investigated at an unprecedented contrast and spatial resolution," said
Joachim Mayer from the Ernst Ruska-Centre for Microscopy and Spectroscopy
with Electrons at the Research Centre Juelich, Germany.
"We are proud to deliver to our customers our promise of the ultimate
performance, stability and flexibility for a new era of groundbreaking
results. We have shown the world record performance at 300kV before, now we
can add the milestone at 80kV," said Rob Fastenau, senior vice president
for FEI's NanoResearch & Industry and NanoBiology market divisions. He
added: "I am very pleased that the Titan 80-300 shows direct atomic
resolution over the entire range of operating voltages. It will give us the
opportunity to further accelerate our mission to remain the world leader in
high-resolution imaging and analysis and an important enabler for the
world's growing nanotechnology industry."
The milestone results were achieved on a Titan 80-300 equipped with an
aberration corrector. The Titan is designed as a dedicated and upgradeable
aberration-corrected system for ultimate performance and ultimate
flexibility. The corrector, developed by CEOS GmbH in close collaboration
with FEI Company, allows for significant resolution improvement and removal
of artifacts that normally hamper direct interpretation of images. The new
resolution achievement underscores the ultimate flexibility and stability
of the Titan 80-300 system.
About FEI Company
FEI's Tools for Nanotech(TM), featuring focused ion- and electron-beam
technologies, deliver 3D characterization, analysis and modification
capabilities with resolution down to the sub-Angstrom level and provide
innovative solutions for customers working in NanoBiology, NanoResearch and
NanoElectronics. With R&D centers in North America and Europe, and sales
and service operations in more than 50 countries around the world, FEI is
bringing the nanoscale within the grasp of leading researchers and
manufacturers and helping to turn some of the biggest ideas of this century
into reality. More information can be found on the FEI website at:
SOURCE FEI Company