SAN JOSE, Calif., Oct. 3 /PRNewswire/ -- Eight technologists were honored
for their significant contributions to the advancement of semiconductor
manufacturing technology at the 29th Annual SEMI Dinner and Award Ceremony
sponsored by Semiconductor Equipment and Materials International (SEMI).
The SEMI North America Awards were presented by SEMI president and CEO,
Stanley T. Myers, during a ceremony held this evening at the Fairmont Hotel in
San Jose, California. This year's recipients were Richard F. Spanier; the
team of Roger Sturgeon, Tom Hedges, Tom Schaefer, Carl Smith, and Mark Zimmer;
and the team of W. Karl Olander and Glenn Tom.
"We honor the SEMI Award recipients for their innovation and dedication to
the creation of technologies that have significantly advanced our industry,"
said Myers. "While the market for semiconductor manufacturing technology may
go up and down, technology development presses on, thanks to the creative
capacities exhibited by innovators such as those being recognized tonight."
Richard Spanier, chairman emeritus of Rudolph Technologies Inc., received
the SEMI Lifetime Achievement Award for his continuous and significant
contributions to technological advancement in the semiconductor manufacturing
industry. Spanier served as chairman and president of Rudolph Technologies
for 30 years, starting in 1966. He relinquished the president's role in 1996
and continued as chairman until 2000, when he was elected chairman emeritus.
Recipients of the Lifetime Achievement Award need to have demonstrated
over the period of their professional career a sustained commitment to
developing technologies that have provided significant value to the progress
of the semiconductor equipment and materials industry. In 1976, Spanier
developed the first fully automated ellipsometer, which provided reliable,
accurate, and quantitative film thickness measurements. In 1990, he invented
and received a patent for simultaneous "multiple angle of incidence"
ellipsometry, which extended the range of applications accessible to
Pioneering an opaque film metrology that promises to be as important to
the semiconductor industry as ellipsometry, Spanier introduced picosecond
ultrasonic laser sonar (PULSE) technology in 1997.
Under his direction, the design team at Rudolph Technologies engineered
the MetaPULSE(R) metrology system to behave like an ellipsometer and to
provide the kind of multi-layer film measurement accuracy and precision to
which metrologists have become accustomed to.
Additionally, five individuals led by Roger Sturgeon received the SEMI
Award for their contribution to the development of the Graphic Data Station
(GDS) data interchange language that converts integrated circuit design data
into machine-readable format for manufacturing. GDS/GDSII was developed at
Calma Co. of Sunnyvale, Calif., in the early 1970s. For the past three
decades, this data interchange software has acted as the essential bridge
between the design phase of IC development and the world of semiconductor
manufacturing. GDSII data is converted into a machine-readable language
called CATS (for Computer Aided Transcription Software) -- also developed by
Sturgeon -- which transcribes the data so that it can be read by the photomask
systems used in the manufacture of semiconductors.
Two scientists at ATMI, Inc., Glenn Tom Ph.D. and W. Karl Olander Ph.D.,
were recognized for the contribution to the Safe Delivery Source (SDS) gas
storage and delivery system for ion implantation. In order to eliminate the
dangers of using hazardous gases stored and delivered under high pressure, Tom
and Olander developed a sub-atmospheric gas delivery system. Using a patented
adsorbent technology, gases are stored below atmospheric pressure, removing
the concerns of catastrophic releases of high-pressure hazardous gases.
Beginning with a concept of in situ gas generation, Tom and Olander
investigated different approaches for storing and delivering semiconductor
gases. Drawing on their earlier experience with zeolites and adsorbents used
for gas abatement and purification, they wondered if they could turn the
reaction around, allowing the solid adsorbent to release the gas molecules,
rather than capturing them. This theory formed the basis of the Safe Delivery
Source, which was introduced commercially in 1993. Today, ion implanters
capable of fully automatic operation with SDS systems are available from all
The SEMI Award for North America, which has been presented annually since
1979, honors individuals who have made significant technical contributions to
the semiconductor industry. Nominations are accepted from individuals of
North American-based member companies of the global semiconductor equipment
and materials industry association.
Based in San Jose, Calif., SEMI is an international industry association
serving more than 2,500 companies participating in the semiconductor and flat
panel display equipment and materials markets. SEMI maintains offices in
Austin, Beijing, Boston, Brussels, Hsinchu, Moscow, Seoul, Singapore, Tokyo
and Washington, D.C. For more information, visit SEMI on the Internet at
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SOURCE Semiconductor Equipment and Materials International