Innovators of Semiconductor Manufacturing Technology Receive 2002 SEMI Award for North America Scientific Achievement in Metrology, Software and Gas Delivery Systems

Recognized at 29th Annual SEMI Dinner and Awards Ceremony



    SAN JOSE, Calif., Oct. 3 /PRNewswire/ -- Eight technologists were honored
 for their significant contributions to the advancement of semiconductor
 manufacturing technology at the 29th Annual SEMI Dinner and Award Ceremony
 sponsored by Semiconductor Equipment and Materials International (SEMI).
     The SEMI North America Awards were presented by SEMI president and CEO,
 Stanley T. Myers, during a ceremony held this evening at the Fairmont Hotel in
 San Jose, California.  This year's recipients were Richard F. Spanier; the
 team of Roger Sturgeon, Tom Hedges, Tom Schaefer, Carl Smith, and Mark Zimmer;
 and the team of W. Karl Olander and Glenn Tom.
     "We honor the SEMI Award recipients for their innovation and dedication to
 the creation of technologies that have significantly advanced our industry,"
 said Myers.  "While the market for semiconductor manufacturing technology may
 go up and down, technology development presses on, thanks to the creative
 capacities exhibited by innovators such as those being recognized tonight."
     Richard Spanier, chairman emeritus of Rudolph Technologies Inc., received
 the SEMI Lifetime Achievement Award for his continuous and significant
 contributions to technological advancement in the semiconductor manufacturing
 industry.  Spanier served as chairman and president of Rudolph Technologies
 for 30 years, starting in 1966.  He relinquished the president's role in 1996
 and continued as chairman until 2000, when he was elected chairman emeritus.
     Recipients of the Lifetime Achievement Award need to have demonstrated
 over the period of their professional career a sustained commitment to
 developing technologies that have provided significant value to the progress
 of the semiconductor equipment and materials industry.  In 1976, Spanier
 developed the first fully automated ellipsometer, which provided reliable,
 accurate, and quantitative film thickness measurements.  In 1990, he invented
 and received a patent for simultaneous "multiple angle of incidence"
 ellipsometry, which extended the range of applications accessible to
 ellipsometers.
     Pioneering an opaque film metrology that promises to be as important to
 the semiconductor industry as ellipsometry, Spanier introduced picosecond
 ultrasonic laser sonar (PULSE) technology in 1997.
     Under his direction, the design team at Rudolph Technologies engineered
 the MetaPULSE(R) metrology system to behave like an ellipsometer and to
 provide the kind of multi-layer film measurement accuracy and precision to
 which metrologists have become accustomed to.
     Additionally, five individuals led by Roger Sturgeon received the SEMI
 Award for their contribution to the development of the Graphic Data Station
 (GDS) data interchange language that converts integrated circuit design data
 into machine-readable format for manufacturing.  GDS/GDSII was developed at
 Calma Co. of Sunnyvale, Calif., in the early 1970s.  For the past three
 decades, this data interchange software has acted as the essential bridge
 between the design phase of IC development and the world of semiconductor
 manufacturing.  GDSII data is converted into a machine-readable language
 called CATS (for Computer Aided Transcription Software) -- also developed by
 Sturgeon -- which transcribes the data so that it can be read by the photomask
 systems used in the manufacture of semiconductors.
     Two scientists at ATMI, Inc., Glenn Tom Ph.D. and W. Karl Olander Ph.D.,
 were recognized for the contribution to the Safe Delivery Source (SDS) gas
 storage and delivery system for ion implantation.  In order to eliminate the
 dangers of using hazardous gases stored and delivered under high pressure, Tom
 and Olander developed a sub-atmospheric gas delivery system.  Using a patented
 adsorbent technology, gases are stored below atmospheric pressure, removing
 the concerns of catastrophic releases of high-pressure hazardous gases.
     Beginning with a concept of in situ gas generation, Tom and Olander
 investigated different approaches for storing and delivering semiconductor
 gases.  Drawing on their earlier experience with zeolites and adsorbents used
 for gas abatement and purification, they wondered if they could turn the
 reaction around, allowing the solid adsorbent to release the gas molecules,
 rather than capturing them.  This theory formed the basis of the Safe Delivery
 Source, which was introduced commercially in 1993.  Today, ion implanters
 capable of fully automatic operation with SDS systems are available from all
 suppliers.
     The SEMI Award for North America, which has been presented annually since
 1979, honors individuals who have made significant technical contributions to
 the semiconductor industry.  Nominations are accepted from individuals of
 North American-based member companies of the global semiconductor equipment
 and materials industry association.
 
     Based in San Jose, Calif., SEMI is an international industry association
 serving more than 2,500 companies participating in the semiconductor and flat
 panel display equipment and materials markets.  SEMI maintains offices in
 Austin, Beijing, Boston, Brussels, Hsinchu, Moscow, Seoul, Singapore, Tokyo
 and Washington, D.C.  For more information, visit SEMI on the Internet at
 www.semi.org.
 
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SOURCE Semiconductor Equipment and Materials International

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