Jet and Flash(TM) Imprint Lithography (J-FIL(TM)) Continues to Gain Momentum as Molecular Imprints Announces Progress at Key Industry Events
Relative merits of imprint lithography and EUV to be debated at the ConFab conference
"Industry opinions are becoming increasingly favorable for J-FIL adoption in the NVM manufacturing community, as key decision makers become aware of its resolution and CoO advantages," said
The ConFab (
At the ConFab, a global conference and business meeting where key decision makers from the semiconductor industry meet to discuss wafer fab manufacturing and economic issues, as well as collaborate on future strategic development activities, Molecular Imprints will participate on the panel "Lithography - Imprint vs. EUV".
SEMICON West (
At SEMICON West, Molecular Imprints will participate in the Lithography Challenges and Solutions segment of the Device Scaling TechXPOT. The session will focus on addressing the lithography issues around enabling volume IC production at the 22nm node. Speakers from leading companies, including Molecular Imprints, IBM, KLA-Tencor, Intel and Nikon, will detail the status of J-FIL, EUV and double patterning, as well as address other pertinent lithography infrastructure topics.
At the DISKCON Japan conference,
The increased visibility of Molecular Imprints has resulted from heightened development activity and system sales in both the semiconductor and HDD markets. The company has sold 12 development and pre-production systems into these markets over the past two years. This activity is expected to increase through the second half of 2009 and into 2010 and beyond.
About Molecular Imprints, Inc.
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanopatterning systems and solutions in the hard disk drive (HDD) and semiconductor industries. MII is leveraging its innovative Jet and Flash(TM) Imprint Lithography (J-FIL(TM)) with IntelliJet(TM) material application technology to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in optics, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels. For more information, visit www.molecularimprints.com.
SOURCE Molecular Imprints, Inc.
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