SKOKIE, Ill., June 22 /PRNewswire/ -- NanoInk, Inc. and SII
NanoTechnology Inc. (SIINT), a subsidiary of Seiko Instruments Inc., today
announced that they have signed an exclusive licensing agreement to provide
nanoscale repair solutions to the photomask industry. The two companies
will collaborate on projects that will involve modification of NanoInk's
proprietary Dip Pen Nanolithography(TM)(DPN(R)) technology to be integrated
with SIINT's photomask repair instruments and nanomachining platforms.
Financial terms of the agreement were not disclosed.
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Photomask repair industry challenges are tied to smaller defects that
cannot be addressed with current options. Both companies anticipate that
with computer chip nodes going down in size to 65nm and 45nm, the photomask
repair industry requires capabilities that are available only with new
technology provided by NanoInk's DPN.
The development work will be performed both in the United States of
America and Japan. With an estimated 65% of photomask customers based in
Asia, NanoInk believes that SIINT is the best partner to offer an excellent
sales and marketing infrastructure to service this demanding market.
"This agreement offers SIINT the opportunity to work closely with a
cutting edge US-based nanotechnology company that has a solid global
intellectual property portfolio," said Dr. Hiroyuki Funamoto, President and
Chief Executive Officer of SIINT. "With this co-development partnership,
SIINT will bring innovative nanoscale repair solutions to the marketplace
in the near future."
"I am thrilled that SIINT has decided to partner with NanoInk to design
and manufacture a platform that can integrate repair capabilities," said
Dr. Cedric Loiret-Bernal, Chief Executive Officer and President, NanoInk,
Inc. "We believe that this agreement will allow the introduction of our
unique DPN technology to global customers while raising standards for
repair within the photomask industry."
NanoInk, Inc. is an emerging growth technology company specializing in
nanometer-scale manufacturing and applications development for the
lifescience and semiconductor industries. With DPN(R), a patented and
proprietary nanofabrication technology that allows for unmatched
flexibility, accuracy and also its high-resolution Nanoencryption(TM)
technology, NanoInk is able to offer its pharmaceutical customers
innovative solutions to fight counterfeiting and illegal diversion of
blockbuster pharmaceutical products. Other key applications include
nanoscale additive repair, and nanoscale rapid prototyping. Located in the
new Illinois Science + Technology Park, north of Chicago, NanoInk currently
has over 100 issued or pending patents and patent applications filed
worldwide and has licensing agreements with Northwestern University,
Stanford University, and the University of Illinois at Urbana- Champaign.
For more information on products and services offered by NanoInk, Inc., see
About SII NanoTechnology
SII NanoTechnology Inc. (SIINT), a subsidiary of Seiko Instruments Inc.
(SII), is a leading company in the development of advanced, leading edge
measurement and analysis instruments. Its head office is located in Tokyo,
Japan. It was the first Japanese company to produce SMP and Focused Ion
Beam (FIB) Systems. The company's products line-up also includes XRF
Analyzers, XRF Coating Thickness Gauges, Thermal Analysis Systems, ICP-OES,
ICP-MS and Mask Repair Systems. Many of these products are utilized to
support leading edge research and development. Additional information about
the company is available on the Internet at http://www.siint.com/en/ .
SOURCE NanoInk, Inc.