NanoInk(R) and SII Nanotechnology (SIINT) Announce an Exclusive Licensing & Co-Development Agreement for Photomask Repair

    SKOKIE, Ill., June 22 /PRNewswire/ -- NanoInk, Inc. and SII
 NanoTechnology Inc. (SIINT), a subsidiary of Seiko Instruments Inc., today
 announced that they have signed an exclusive licensing agreement to provide
 nanoscale repair solutions to the photomask industry. The two companies
 will collaborate on projects that will involve modification of NanoInk's
 proprietary Dip Pen Nanolithography(TM)(DPN(R)) technology to be integrated
 with SIINT's photomask repair instruments and nanomachining platforms.
 Financial terms of the agreement were not disclosed.
     (Logo: http://www.newscom.com/cgi-bin/prnh/20060410/NANOLOGO )
     Photomask repair industry challenges are tied to smaller defects that
 cannot be addressed with current options. Both companies anticipate that
 with computer chip nodes going down in size to 65nm and 45nm, the photomask
 repair industry requires capabilities that are available only with new
 technology provided by NanoInk's DPN.
     The development work will be performed both in the United States of
 America and Japan. With an estimated 65% of photomask customers based in
 Asia, NanoInk believes that SIINT is the best partner to offer an excellent
 sales and marketing infrastructure to service this demanding market.
     "This agreement offers SIINT the opportunity to work closely with a
 cutting edge US-based nanotechnology company that has a solid global
 intellectual property portfolio," said Dr. Hiroyuki Funamoto, President and
 Chief Executive Officer of SIINT. "With this co-development partnership,
 SIINT will bring innovative nanoscale repair solutions to the marketplace
 in the near future."
     "I am thrilled that SIINT has decided to partner with NanoInk to design
 and manufacture a platform that can integrate repair capabilities," said
 Dr. Cedric Loiret-Bernal, Chief Executive Officer and President, NanoInk,
 Inc. "We believe that this agreement will allow the introduction of our
 unique DPN technology to global customers while raising standards for
 repair within the photomask industry."
     About NanoInk(R)
     NanoInk, Inc. is an emerging growth technology company specializing in
 nanometer-scale manufacturing and applications development for the
 lifescience and semiconductor industries. With DPN(R), a patented and
 proprietary nanofabrication technology that allows for unmatched
 flexibility, accuracy and also its high-resolution Nanoencryption(TM)
 technology, NanoInk is able to offer its pharmaceutical customers
 innovative solutions to fight counterfeiting and illegal diversion of
 blockbuster pharmaceutical products. Other key applications include
 nanoscale additive repair, and nanoscale rapid prototyping. Located in the
 new Illinois Science + Technology Park, north of Chicago, NanoInk currently
 has over 100 issued or pending patents and patent applications filed
 worldwide and has licensing agreements with Northwestern University,
 Stanford University, and the University of Illinois at Urbana- Champaign.
 For more information on products and services offered by NanoInk, Inc., see
 http://www.nanoink.net .
     About SII NanoTechnology
     SII NanoTechnology Inc. (SIINT), a subsidiary of Seiko Instruments Inc.
 (SII), is a leading company in the development of advanced, leading edge
 measurement and analysis instruments. Its head office is located in Tokyo,
 Japan. It was the first Japanese company to produce SMP and Focused Ion
 Beam (FIB) Systems. The company's products line-up also includes XRF
 Analyzers, XRF Coating Thickness Gauges, Thermal Analysis Systems, ICP-OES,
 ICP-MS and Mask Repair Systems. Many of these products are utilized to
 support leading edge research and development. Additional information about
 the company is available on the Internet at http://www.siint.com/en/ .
 
 

SOURCE NanoInk, Inc.

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