NEW YORK, Jan. 12, 2016 /PRNewswire/ -- Patterning refers to a method of photolithography to build integrated circuits on wafers in the electronic device fabrication process. Patterning materials refer to polymer films, also called as photoresist, on which the desired pattern is deposited through exposure of light of specific wavelength. Patterning materials are basically used in the process of manufacturing printed circuit boards. Patterning materials find major applications in the semi-conductor industry. The use of these chemicals is in semi-conductor materials which are basically silicon wafers to imprint the desired circuitry and obtain integrated circuits as an end product.
Asia-Pacific region dominated the global patterning materials market size in terms of value in 2014 with around 35% share in the global market. Asia-Pacific is projected to have the highest market size in terms of value as well as volume by 2020, followed by the North America region. RoW is also projected to be the fastest growing market, at a CAGR of around 10.0% from 2015 to 2020, owing to rise in consumption in the region, where end-user markets of patterning materials is growing steadily, especially in automotive and electronics sectors.
This study estimates the market size in terms of value and volume for patterning materials and projects the same by 2020. As a part of quantitative analysis, the study segments the market by types, by applications, and by region with the current market estimation and forecast till 2020. The regions covered in the report are North America, Europe, Asia-Pacific, and RoW. The segmentation by application includes DRAM, automotive sensors, MEMS & NEMS devices, glass printed circuit boards, and others. Further as a part of qualitative analysis, the research provides a comprehensive review of major market drivers, restraints, opportunities, burning issues, challenges, and key issues in the market. It also includes the company profiling and competitive strategies adopted by different market players, including Fujifilm Holding Corporation (Japan), JSR Micro Inc. (U.S.), Merck KGaA (Germany), Shin-etsu Chemical Co., Ltd. (Japan), and others.
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