Photronics Helps Launch Europe's Advanced Reticle Center

Consortium is Formed to Address Europe's Growing Demand for Advanced

Reticle Technology



Apr 23, 2001, 01:00 ET from Photronics, Inc.

    STUTTGART, Germany April 23 /PRNewswire Interactive News Release/ --
 Photronics, Inc. (Nasdaq:   PLAB) the world's leading sub-wavelength reticle
 solutions supplier, announced today that it has become one of the founding
 members of the Advanced Reticle Center (ARC), a European research consortium.
 The ARC, which is located in Stuttgart, Germany, has been formed by a number
 of companies and institutes with the common goal of accelerating the
 development of advanced reticle manufacturing technologies. The membership is
 comprised of Photronics and leading-edge equipment and material suppliers, as
 well as software developers and research institutes. The consortium is
 partnering to facilitate an advanced research pilot line for reticles by
 providing their expertise, advanced tools, materials and services. Financial
 details of the partnership were not disclosed.
     James L. Mac Donald, President of Photronics stated, "Photronics' role as
 a founding member of the ARC exemplifies our commitment to meet the growing
 European demand for sub-wavelength reticle solutions. We believe that our
 contributions as an ARC member, when combined with our partnership with IMEC
 for 193nm technology development, will leverage the technological capabilities
 of our European manufacturing network for the volume production of advanced
 reticles at the sub-130nm technology node."
     In addition to Photronics, ARC members include ASM Lithography, ARCH
 Chemicals, Heidelberg Instruments, IMEC, IMS-CHIPS, Leica Microsystems, M+W
 Zander, PDF Solutions GmbH aiss division, Schott ML GmbH, Steag Hamatech AG
 and Unaxis USA, Inc. Each member is represented on the organization's Advisory
 Board, which is responsible for achieving the strategic objectives of the ARC.
     Jack Moneta, Senior Vice President of Strategic Planning & Business
 Development, will be representing Photronics on this board. "Our participation
 in the ARC is an excellent way for Photronics to complement our internal R&D
 resources. By working together as a team, concerted attention will be applied
 to various advanced reticle manufacturing and wafer lithography challenges,"
 commented Mr. Moneta. "As a result, ARC members expect to accelerate the
 process development that is essential to meeting the demands of leading IC
 manufacturers seeking greater functionality and performance for their future
 devices." In addition to its substantial technology and manufacturing
 infrastructure, Photronics contributes its innovative Sub-Wavelength Reticle
 Solutions(TM)" family of process technologies and its unique perspective of
 practical advanced reticle manufacturing applications for leading global
 semiconductor manufacturers around the globe.
     As its first project, the members of the ARC will focus their expertise on
 reticle performance dynamics and the essential requirements at the reticle
 plane to fabricate integrated circuit designs for the 70 nanometer (or 0.07
 micron) technology node. All intellectual property developed as a result of
 the ARC's research will be restricted for the use of designated ARC members.
     Additional information will be available at the company's exhibit at
 Semicon Europa in Munich, Germany from April 24 to 26 at Stand number B 1-328.
 
     Photronics is a leading worldwide manufacturer of photomasks. Photomasks
 are high precision quartz plates that contain microscopic images of electronic
 circuits. A key element in the manufacture of semiconductors, photomasks are
 used to transfer circuit patterns onto semiconductor wafers during the
 fabrication of integrated circuits. They are produced in accordance with
 circuit designs provided by customers at strategically located manufacturing
 facilities in Asia, Europe, and North America. Additional information on the
 Company can be accessed at http://www.photronics.com.
 
     "Safe Harbor" Statement under the Private Securities Litigation Reform Act
 of 1995: Except for historical information, the matters discussed in this news
 release that may be considered forward-looking statements may be subject to
 certain risks and uncertainties that could cause the actual results to differ
 materially from those projected, including, but not limited to, uncertainties
 in the market, pricing competition, procurement and manufacturing
 efficiencies, described in the Company's Annual Report on form 10-k for the
 year ended October 31, 2000 under the caption "Forward Looking Information"
 and other risks detailed from time to time in the Company's other SEC reports.
 The Company assumes no obligation to update the information in this release.
 
                     MAKE YOUR OPINION COUNT -  Click Here
                http://tbutton.prnewswire.com/prn/11690X38618517
 
 

SOURCE Photronics, Inc.
    STUTTGART, Germany April 23 /PRNewswire Interactive News Release/ --
 Photronics, Inc. (Nasdaq:   PLAB) the world's leading sub-wavelength reticle
 solutions supplier, announced today that it has become one of the founding
 members of the Advanced Reticle Center (ARC), a European research consortium.
 The ARC, which is located in Stuttgart, Germany, has been formed by a number
 of companies and institutes with the common goal of accelerating the
 development of advanced reticle manufacturing technologies. The membership is
 comprised of Photronics and leading-edge equipment and material suppliers, as
 well as software developers and research institutes. The consortium is
 partnering to facilitate an advanced research pilot line for reticles by
 providing their expertise, advanced tools, materials and services. Financial
 details of the partnership were not disclosed.
     James L. Mac Donald, President of Photronics stated, "Photronics' role as
 a founding member of the ARC exemplifies our commitment to meet the growing
 European demand for sub-wavelength reticle solutions. We believe that our
 contributions as an ARC member, when combined with our partnership with IMEC
 for 193nm technology development, will leverage the technological capabilities
 of our European manufacturing network for the volume production of advanced
 reticles at the sub-130nm technology node."
     In addition to Photronics, ARC members include ASM Lithography, ARCH
 Chemicals, Heidelberg Instruments, IMEC, IMS-CHIPS, Leica Microsystems, M+W
 Zander, PDF Solutions GmbH aiss division, Schott ML GmbH, Steag Hamatech AG
 and Unaxis USA, Inc. Each member is represented on the organization's Advisory
 Board, which is responsible for achieving the strategic objectives of the ARC.
     Jack Moneta, Senior Vice President of Strategic Planning & Business
 Development, will be representing Photronics on this board. "Our participation
 in the ARC is an excellent way for Photronics to complement our internal R&D
 resources. By working together as a team, concerted attention will be applied
 to various advanced reticle manufacturing and wafer lithography challenges,"
 commented Mr. Moneta. "As a result, ARC members expect to accelerate the
 process development that is essential to meeting the demands of leading IC
 manufacturers seeking greater functionality and performance for their future
 devices." In addition to its substantial technology and manufacturing
 infrastructure, Photronics contributes its innovative Sub-Wavelength Reticle
 Solutions(TM)" family of process technologies and its unique perspective of
 practical advanced reticle manufacturing applications for leading global
 semiconductor manufacturers around the globe.
     As its first project, the members of the ARC will focus their expertise on
 reticle performance dynamics and the essential requirements at the reticle
 plane to fabricate integrated circuit designs for the 70 nanometer (or 0.07
 micron) technology node. All intellectual property developed as a result of
 the ARC's research will be restricted for the use of designated ARC members.
     Additional information will be available at the company's exhibit at
 Semicon Europa in Munich, Germany from April 24 to 26 at Stand number B 1-328.
 
     Photronics is a leading worldwide manufacturer of photomasks. Photomasks
 are high precision quartz plates that contain microscopic images of electronic
 circuits. A key element in the manufacture of semiconductors, photomasks are
 used to transfer circuit patterns onto semiconductor wafers during the
 fabrication of integrated circuits. They are produced in accordance with
 circuit designs provided by customers at strategically located manufacturing
 facilities in Asia, Europe, and North America. Additional information on the
 Company can be accessed at http://www.photronics.com.
 
     "Safe Harbor" Statement under the Private Securities Litigation Reform Act
 of 1995: Except for historical information, the matters discussed in this news
 release that may be considered forward-looking statements may be subject to
 certain risks and uncertainties that could cause the actual results to differ
 materially from those projected, including, but not limited to, uncertainties
 in the market, pricing competition, procurement and manufacturing
 efficiencies, described in the Company's Annual Report on form 10-k for the
 year ended October 31, 2000 under the caption "Forward Looking Information"
 and other risks detailed from time to time in the Company's other SEC reports.
 The Company assumes no obligation to update the information in this release.
 
                     MAKE YOUR OPINION COUNT -  Click Here
                http://tbutton.prnewswire.com/prn/11690X38618517
 
 SOURCE  Photronics, Inc.