Photronics Signs Supplier Agreement with JENOPTIK for Unique Photomasks

Marks Company's Expansion into the Photonics Market



Apr 23, 2001, 01:00 ET from Photronics, Inc.

    DRESDEN, Germany, April 23 /PRNewswire Interactive News Release/ --
 Photronics, Inc. (Nasdaq:   PLAB) the world's leading sub-wavelength reticle
 solutions supplier, announced today that it has entered into a multi-year
 supplier agreement with JENOPTIK Laser, Optik, Systeme GmbH for the production
 of special photomasks required to produce advanced binary optic products.
 Working together, the two companies will utilize and develop high performance
 mask technology to service the growing market of new photonic applications.
 Photronics, which has led the photomask industry in adapting its advanced
 processes and technology to support the emerging demand for reticle technology
 in photonics applications, will manufacture imaged patterns on quartz plates
 for JENOPTIK, who will use these plates for the fabrication of Binary Optic
 Components.  As part of the agreement, JENOPTIK will contribute advanced
 equipment, and Photronics will provide a guaranteed long-term source of
 supply.  Other terms of the agreement were not disclosed.
     "This is a major step by the Company into a new market for advanced
 photomask technology," said Jack Moneta, Photronics' Senior Vice President of
 Strategic Planning & Business Development.  "The emerging market for photonics
 applications represents a new and exciting frontier for the types of
 technology and services we are delivering all around the world.  By excelling
 at specialty applications such as this, which emanates from our strengths in
 high-performance IC technology, we open up new growth opportunities in a young
 and rapidly growing technology."
     Photronics and JENOPTIK have worked closely together over the last several
 years, which led to the development of this formal supplier agreement.
 "Photronics has made significant progress in advancing the technology required
 to produce sub-micron resolution patterns and curves with low edge roughness,"
 stated Norbert Thiel, President of JENOPTIK Laser, Optik, Systeme GmbH.
     "Their mask-making expertise and experience with electron-beam technology
 and wet and plasma etch processing complements our technology and know-how in
 optics and enables JENOPTIK to consolidate its leadership role in Binary
 Optics."
     Traditionally, photomasks are used by Integrated Device Manufacturers
 (IDMs) to transfer circuit patterns onto silicon wafers during the manufacture
 of integrated circuits.  A typical photomask set may consist of 20 to 35
 individual layers, which are inserted into the lithography system one at time
 to sequentially image the complete circuitry on the wafer in a "build-up"
 fashion.
     Binary Optic Components serve as advanced optical elements in imaging
 systems, illumination systems, measurement systems or sensors.  They realize
 new optical functions or integrate numerous micro optical elements.  Binary
 Optics Components often address the critical performance requirements of the
 systems they will become a part of.  So Binary Optics are needed for the exact
 alignment of the wafers in the systems' image fields as well as for the
 observation and correction of the projection properties in advanced
 lithography systems.
 
     Photronics is a leading worldwide manufacturer of photomasks.  Photomasks
 are high precision quartz plates that contain microscopic images of electronic
 circuits.  A key element in the manufacture of semiconductors, photomasks are
 used to transfer circuit patterns onto semiconductor wafers during the
 fabrication of integrated circuits.  They are produced in accordance with
 circuit designs provided by customers at strategically located manufacturing
 facilities in Asia, Europe, and North America.  Additional information on the
 Company can be accessed at http://www.photronics.com.
 
     JENOPTIK Laser, Optik Systeme GmbH, a 100 percent subsidiary of the
 technology group, JENOPTIK AG of Jena, Germany (German securities number
 622910), was founded in 1995.  Within the fields of laser technology, optics
 and sensor systems the company develops, manufactures and distributes laser
 sources, and optical components, modules and system solutions as well as
 technology for the precise measuring, imaging, structuring and analysis of a
 variety of materials.  Applications tailored to customer needs and
 state-of-the-art technology have been the key to the company's success.  The
 472 employees of JENOPTIK Laser, Optik, Systeme GmbH contributed to sales of
 62.9 million euros in 2000.
 
     "Safe Harbor" Statement under the Private Securities Litigation Reform Act
 of 1995: Except for historical information, the matters discussed in this news
 release that may be considered forward-looking statements may be subject to
 certain risks and uncertainties that could cause the actual results to differ
 materially from those projected, including, but not limited to, uncertainties
 in the market, pricing competition, procurement and manufacturing
 efficiencies, described in the Company's Annual Report on form 10-K for the
 year ended October 31, 2000 under the caption "Forward-Looking Information"
 and other risks detailed from time to time in the Company's other SEC
 reports.  The Company assumes no obligation to update the information in this
 release.
 
                     MAKE YOUR OPINION COUNT -- Click Here
                http://tbutton.prnewswire.com/prn/11690X13529538
 
 

SOURCE Photronics, Inc.
    DRESDEN, Germany, April 23 /PRNewswire Interactive News Release/ --
 Photronics, Inc. (Nasdaq:   PLAB) the world's leading sub-wavelength reticle
 solutions supplier, announced today that it has entered into a multi-year
 supplier agreement with JENOPTIK Laser, Optik, Systeme GmbH for the production
 of special photomasks required to produce advanced binary optic products.
 Working together, the two companies will utilize and develop high performance
 mask technology to service the growing market of new photonic applications.
 Photronics, which has led the photomask industry in adapting its advanced
 processes and technology to support the emerging demand for reticle technology
 in photonics applications, will manufacture imaged patterns on quartz plates
 for JENOPTIK, who will use these plates for the fabrication of Binary Optic
 Components.  As part of the agreement, JENOPTIK will contribute advanced
 equipment, and Photronics will provide a guaranteed long-term source of
 supply.  Other terms of the agreement were not disclosed.
     "This is a major step by the Company into a new market for advanced
 photomask technology," said Jack Moneta, Photronics' Senior Vice President of
 Strategic Planning & Business Development.  "The emerging market for photonics
 applications represents a new and exciting frontier for the types of
 technology and services we are delivering all around the world.  By excelling
 at specialty applications such as this, which emanates from our strengths in
 high-performance IC technology, we open up new growth opportunities in a young
 and rapidly growing technology."
     Photronics and JENOPTIK have worked closely together over the last several
 years, which led to the development of this formal supplier agreement.
 "Photronics has made significant progress in advancing the technology required
 to produce sub-micron resolution patterns and curves with low edge roughness,"
 stated Norbert Thiel, President of JENOPTIK Laser, Optik, Systeme GmbH.
     "Their mask-making expertise and experience with electron-beam technology
 and wet and plasma etch processing complements our technology and know-how in
 optics and enables JENOPTIK to consolidate its leadership role in Binary
 Optics."
     Traditionally, photomasks are used by Integrated Device Manufacturers
 (IDMs) to transfer circuit patterns onto silicon wafers during the manufacture
 of integrated circuits.  A typical photomask set may consist of 20 to 35
 individual layers, which are inserted into the lithography system one at time
 to sequentially image the complete circuitry on the wafer in a "build-up"
 fashion.
     Binary Optic Components serve as advanced optical elements in imaging
 systems, illumination systems, measurement systems or sensors.  They realize
 new optical functions or integrate numerous micro optical elements.  Binary
 Optics Components often address the critical performance requirements of the
 systems they will become a part of.  So Binary Optics are needed for the exact
 alignment of the wafers in the systems' image fields as well as for the
 observation and correction of the projection properties in advanced
 lithography systems.
 
     Photronics is a leading worldwide manufacturer of photomasks.  Photomasks
 are high precision quartz plates that contain microscopic images of electronic
 circuits.  A key element in the manufacture of semiconductors, photomasks are
 used to transfer circuit patterns onto semiconductor wafers during the
 fabrication of integrated circuits.  They are produced in accordance with
 circuit designs provided by customers at strategically located manufacturing
 facilities in Asia, Europe, and North America.  Additional information on the
 Company can be accessed at http://www.photronics.com.
 
     JENOPTIK Laser, Optik Systeme GmbH, a 100 percent subsidiary of the
 technology group, JENOPTIK AG of Jena, Germany (German securities number
 622910), was founded in 1995.  Within the fields of laser technology, optics
 and sensor systems the company develops, manufactures and distributes laser
 sources, and optical components, modules and system solutions as well as
 technology for the precise measuring, imaging, structuring and analysis of a
 variety of materials.  Applications tailored to customer needs and
 state-of-the-art technology have been the key to the company's success.  The
 472 employees of JENOPTIK Laser, Optik, Systeme GmbH contributed to sales of
 62.9 million euros in 2000.
 
     "Safe Harbor" Statement under the Private Securities Litigation Reform Act
 of 1995: Except for historical information, the matters discussed in this news
 release that may be considered forward-looking statements may be subject to
 certain risks and uncertainties that could cause the actual results to differ
 materially from those projected, including, but not limited to, uncertainties
 in the market, pricing competition, procurement and manufacturing
 efficiencies, described in the Company's Annual Report on form 10-K for the
 year ended October 31, 2000 under the caption "Forward-Looking Information"
 and other risks detailed from time to time in the Company's other SEC
 reports.  The Company assumes no obligation to update the information in this
 release.
 
                     MAKE YOUR OPINION COUNT -- Click Here
                http://tbutton.prnewswire.com/prn/11690X13529538
 
 SOURCE  Photronics, Inc.