Brewer Science's New OptiLign™ DSA Product Family Provides a Cost-Effective Alternative for Advanced-Node Wafer Patterning

Although Moore's law is slowing, many foundries and integrated device manufacturers are continuing efforts to scale to finer nodes. As feature sizes shrink more aggressively with each node, the limits of manufacturing equipment are being stretched, and it has become cost-prohibitive to create them using existing patterning processes like self-aligned double patterning and self-aligned quadruple patterning. While the industry is close to the commercialization of extreme ultraviolet (EUV) lithography, the tool cost will limit its use. DSA offers an alternative to existing processes and can be performed on existing, installed fab tool sets. Additionally, DSA will serve as a complement to EUV when it becomes fully available.

"Taking OptiLign materials from pilot line to commercial-scale production represents the next significant milestone in making DSA a viable option for semiconductor manufacturing," said Dr. Srikanth (Sri) Kommu, executive director, Semiconductor Business, Brewer Science, Inc. "Historically, the industry has relied on equipment enhancements to reach the next technology node. Now, materials solutions are stepping in to provide that edge and extend tool capabilities. The OptiLign product family is an example of this paradigm shift."

Brewer Science's OptiLign™ family of DSA products provides all the materials needed for self-assembly. Block copolymers define the pattern. Neutral layers allow the pattern to be formed on each layer. Lastly, guiding layers tell the material which way and how to orient. All the materials are designed to work together for optimal performance, and are dependent on material and surface energy. Additionally, through its partnership with Arkema, Brewer Science has tapped into a way to deliver DSA materials that allows for consistent feature sizes via a unique polymer production process. This process allows for the large scale needed to support an entire technology node, as well as a unique polymer quality and reproducibility, all of which sets OptiLign materials apart from the competition.

"Feature size is built into the molecular structure of the DSA materials and can vary from batch to batch, so securing a sub-nanometric reproducibility can be challenging," explained Dr. Ian Cayrefourcq, Director of Emerging Technologies, Arkema. "Arkema's special process for formulating large batches of polymers of the same size allows Brewer Science to supply a fab with consistent feature sizes for the technology node's life span."

To learn more about OptiLign materials, visit Brewer Science's booth #110 at SPIE Advanced Lithography 2018, February 25 - March 1, 2018 in San Jose, California.

About Brewer Science
Brewer Science is a global technology leader in developing and manufacturing innovative materials and processes for the reliable fabrication of cutting-edge microdevices used in electronics such as tablet computers, smartphones, digital cameras, televisions, LED lighting and flexible technology products. In 1981, Brewer Science revolutionized lithography processes with its invention of ARC^® materials. Today, Brewer Science continues to expand its technology portfolio to include products enabling advanced lithography, thin wafer handling, 3D integration, and chemical and mechanical device protection and products based on nanotechnology. With its headquarters in Rolla, Missouri, Brewer Science supports customers throughout the world with a service and distribution network in North America, Europe and Asia. We invite you to learn more about Brewer Science at www.brewerscience.com, follow us on Twitter at @BrewerScience, like us on Facebook and subscribe to our blog.

SOURCE Brewer Science

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