Sub-100nm Lithography: Market Analysis and Strategic Issues

DUBLIN, April 11, 2014 /PRNewswire/ --

Research and Markets (http://www.researchandmarkets.com/research/7jmxfr/sub100nm) has announced the addition of the "Sub-100nm Lithography: Market Analysis and Strategic Issues" report to their offering.
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The continued improvements in lithography have been the driving force that has upheld Moore's Law. Shorter wavelengths, better lenses, and adaptive optics have all contributed to this success story, which has allowed commercial chips to be fabricated with 14nm feature sizes

This report examines and projects the technologies involved, their likely developments, what problems and choices are facing users, and where the opportunities and pitfalls are. The worldwide markets are analyzed and projected.

Key Topics Covered:

Chapter 1 Introduction
1.1 The Need For This Report

Chapter 2 Executive Summary
2.1 Summary of Major Issues
2.2 Summary of Market Opportunities

Chapter 3 Lithography Issues And Trends
3.1 Optical Systems
3.1.1 Step-and-Repeat Aligners
3.1.2 248nm DUV Resist
3.1.3 193nm DUV Resist
3.1.4 Mix-and-Match
3.1.5 Immersion Lithography
3.1.6 EUV
3.2 X-Ray Systems
3.2.1 X-Ray Sources
3.2.2 X-Ray Masks
3.2.3 X-Ray Steppers
3.2.4 X-Ray Resists
3.3 Electron Beam Systems
3.4 Ion Beam Systems
3.4.1 Direct Write
3.4.2 Ion Channel Masking
3.4.3 Ion Projection
3.5 Nano-Imprint Lithography
3.6 New Technologies
3.6.1 Mulith Reference Distribution Aerial Image Formation
3.6.2 Holograms
3.6.3 X-Ray Laser
3.6.4 Atom Lithography
3.6.5 Microlenses
3.6.7 EWL Lithography
3.7 Evaluation of Lithography Cost of Ownership
3.7.1 Introduction
3.7.2 Cost of Ownership Model
3.7.3 Results of Cost of Ownership Calculation
3.7.4 Individual Cost Estimation
3.8 Conclusion

Chapter 4 User - Supplier Strategies
4.1 Determining Lithography Needs
4.2 Benchmarking a Vendor
4.2.1 Pricing
4.2.2 Vendor Commitment and Attitudes
4.2.3 Vendor Capabilities
4.2.4 System Capabilities
4.2.5 Vendor Feedback During Equipment Evaluation
4.2.6 Vendor Feedback During Device Production
4.3 Competitive Environment
4.4 Equipment For Class 1 Cleanrooms
4.5 Equipment For the Factory of the Future
4.6 Opportunities

Chapter 5 Market Forecast
5.1 Driving Forces
5.1.1 Technical Trends
5.1.2 Economic Trends
5.1.3 Optical Limitations
5.2 Market Forecast Assumptions
5.3 Market Forecast



For more information visit http://www.researchandmarkets.com/research/7jmxfr/sub100nm

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