Loehmann's To Announce Winners of NY Design Challenge A Contest With FIT Fashion Design Students
Winning Design Showcased In Loehmann's Chelsea Window
NEW YORK, March 28, 2013 /PRNewswire/ -- Three students at the Fashion Institute of Technology (FIT) who were named finalists in off-price specialty retailer Loehmann's NY Design Challenge competition, held exclusively with FIT. Ou Ma of Beijing, China; Maor Tapiro from Brooklyn, NY; and Ying Wang of Xi'an, China, received the highest number of votes out of seven semi-finalists during a weeklong contest held on Loehmann's Facebook page.
(Logo: http://photos.prnewswire.com/prnh/20121010/NY89568LOGO )
A grand prize winner will be announced at a celebratory event on April 3rd, 2013 at Loehmann's Chelsea Store, 101 7th Ave at 16th street. The winning garment will be showcased in the Loehmann's Chelsea storefront window.
The competition, first announced by Loehmann's during its Fashion's Night Out runway show in September 2012, attracted 15 students from FIT's Fashion Design program, who each submitted up to three avant-garde evening wear designs using famous New York City landmarks as their inspiration. Ma's design was inspired by the Guggenheim Museum; Tapiro's design was inspired by the Brooklyn Bridge; and Wang's design was inspired by The Highline.
About Loehmann's:
Loehmann's... Real Designers. Really Discounted. The nation's first upscale off-price retailer offers top designer fashion from the most noted names at legendary prices... always 30-65% less than prices you'll find elsewhere. Headquartered in the Bronx, New York, and privately held, Loehmann's operates 40 stores in 11 states across the country and Washington, D.C., plus an ecommerce site. For more information, visit www.loehmanns.com.
About FIT:
The internationally renowned Fashion Design program at the Fashion Institute of Technology (FIT) was established in 1944, the year the college was founded. The program's close ties to industry help ensure that the curriculum continually evolves, immersing students in current real-world practice. The program provides both an essential foundation for creating apparel and advanced study in specialized areas. Students intern with leading designers and design houses, and have the opportunity to study abroad, in FIT's programs in Florence and Milan. Notable alumni include Calvin Klein, Michael Kors, Nanette Lepore, Amsale Aberra, Reem Acra, Nina Garcia, Francisco Costa, Brian Atwood, Ralph Rucci, Michelle Smith, Andrew Fezza, Dennis Basso, Norma Kamali, John Bartlett, Stephen Burrows, Jhane Barnes, Miranda Morrison, Kari Sigerson, and Rebecca Moses.
FIT is a leader in career education in art, design, business, and technology, with a wide range of programs that are affordable and relevant to today's rapidly changing industries. A college of the State University of New York, FIT offers more than 45 majors leading to the AAS, BFA, BS, MA, MFA, and MPS degrees. Visit fitnyc.edu.
SOURCE Loehmann's
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