Molecular Imprints Receives Multiple Unit Purchase Order To Provide Advanced Lithography Equipment For High Volume Semiconductor Manufacturing

Molecular Imprints Jet and Flash™ Imprint Lithography (J-FIL™) On Track for Semiconductor Memory Production in 2014

Sep 24, 2012, 11:00 ET from Molecular Imprints, Inc.

AUSTIN, Texas, Sept. 24, 2012 /PRNewswire/ -- Molecular Imprints, Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has received a purchase order for multiple imprint modules that will be integrated into a semiconductor equipment company's stepper systems.  These modules include the latest MII proprietary Jet and Flash Imprint Lithography (J-FIL) technology which delivers the performance required for high volume manufacturing of advanced semiconductor memory devices.

(Logo: )

"This multiple module purchase represents a vote of confidence from our customers that J-FIL is in the final stages of manufacturing readiness," said Mark Melliar-Smith, President and CEO of Molecular Imprints.  "Our equipment and commercial mask partners and internal teams have successfully coordinated their development activities and made tremendous progress over the last year, particularly in areas of defectivity and overall Cost of Ownership (CoO).  We look forward to the next phase of commercializing our J-FIL technology and to enable the semiconductor memory device roadmap for years to come."

The company's J-FIL technology has demonstrated 24nm patterning with exceptional line edge roughness (<2nm LER, 3 sigma) and critical dimension uniformity (1.2nm CDU, 3 sigma) with extensibility to 10nm using a simple single patterning step process.  J-FIL's inherent CoO advantages achieved by avoiding power limited EUV light sources, complex optical lenses and mirrors, and difficulties with imaging using ultrasensitive photoresists, make it well aligned with semiconductor memory manufacturing. 

About Molecular Imprints, Inc.
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanopatterning systems and solutions.  MII is leveraging its innovative Jet and Flash™ Imprint Lithography (J-FIL™) technology to become the worldwide market and technology leader in high-volume patterning solutions for semiconductor memory devices, while enabling emerging markets in display, clean energy, biotechnology and other industries.  MII enables nanoscale patterning by delivering a comprehensive imprint lithography solution that is affordable, compatible and extendible to sub-10 nanometer dimensions. For more information or to follow us on twitter, visit

Corporate PR Contact
Paul Hofemann
Molecular Imprints, Inc.

SOURCE Molecular Imprints, Inc.