SINGULUS Launches New Version of Thin Film Processing System VITRUM at Intersolar North America 2011

KAHL AM MAIN, Germany, June 30, 2011 /PRNewswire/ -- After the successful launch in Munich (Germany), SINGULUS TECHNOLOGIES AG (SINGULUS) provides information about the enhanced wet-chemical processing system for thin film solar VITRUM GEN 2 at the Intersolar North America. With its innovative Solar portfolio including new production and process concepts, the company underlines its leading position of its successful and high-efficiency solar production technologies. The US market launch of the VITRUM GEN 2 will be in the spotlight at the SINGULUS booth 9335. It offers substantial cost-saving potential and can easily be integrated into already existing manufacturing lines.

US Market Launch of New Process Tool VITRUM for Backside and Pencil Etch

As part of the product family VITRUM GEN 2 the new processing machine simultaneously cleans back-sides and edges of thin film solar cells in a single working step. In addition to the automated process control, the new single-side etching tool protects the active layer by process hoods and performs pencil and rear side etching with brushes and chemicals. VITRUM GEN 2 is the only tool on the market that cleans the rear side and the edges in one single step without any harm to the active layers. It is used for cleaning after oven processes as well as for etching of undesirable coatings on rear side and edges, for example CdTe or CdS.

Reducing Production Steps and Costs with VITRUM GEN 2

The VITRUM GEN 2 provides the platform for several different process steps: At a CdTe manufacturing process it performs six steps, starting with glass washing, back side cleaning CdTe, CdCl2 deposition using roller and salt removal to glass washing and developer. When producing a-Si/muc-Si and CIS/CIGS cells VITRUM features glass washing as well as TCO etching, KCN etching or NH3 treatment respectively. In addition it also provides NP, DAE and EDTA etching for substrate sizes up to 2,200.

In comparison to dipping processes, the second generation VITRUM enables homogeneous, reliable and reproducible etching. It features further advantages in compared to a dipping bath such as a higher etch length and concentration, a higher process speed of up to 5 m/min and minimized carryover.

The new design of the VITRUM GEN 2 improves the accessibility for optimized maintenance work in a large installation cabinet. Piping is similar for all liquid circuits. It offers a high cycle rate and is also easy to integrate into existing production lines. The new VITRUM GEN 2 substantially reduces the investment outlay and very rapidly pays its way.

SINGULUS TECHNOLOGIES AG, Hanauer Landstrasse 103,

D-63796 Kahl/Main, ISIN: DE0007238909, WKN: 723890

Visit SINGULUS at Intersolar North America booth 9335 from July 12 - 14, 2011, at the Moscone Center in San Francisco, California.

SOURCE SINGULUS TECHNOLOGIES AG