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2014

Axcelis Announces Multiple Wins for 'Purion XE' High Energy System Including New Foundry Penetration

Innovative Platform Delivers Industry Leading Purity, Precision and Productivity to Meet Future Process Challenges as Well as Today's Production Requirements

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BEVERLY, Mass., Jan. 9, 2014 /PRNewswire/ -- Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of enabling ion implantation solutions for the semiconductor industry, announced multiple wins for the Company's Purion XE single wafer,  high energy implanter from two leading chipmakers located in the Asia Pacific region. The wins include the penetration of a new foundry process dedicated to advanced image sensor devices, as well as a follow on order from a new fab focused on advanced NAND devices.

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Mary Puma, chairman and CEO, said, "We are very excited about these recent high energy sales, allowing us to further extend our leadership position in this application space. These purchases were driven by customer requirements for superior metals and particulate contamination control, while meeting aggressive goals for productivity and process extendibility.  The Purion XE exceeded expectations on both of these metrics, making it the high energy implanter of choice." 

The Purion XE, featuring Axcelis' industry leading LINAC technology, is the most advanced high energy system available today.  The system leverages the powerful Purion platform to provide chipmakers with absolute process precision and purity while delivering remarkable levels of productivity and capital efficiency.

The Purion Platform
The Purion platform is redefining implanter technology and performance, with each product setting a new benchmark in its respective market.  The powerful common platform enables the efficient production of all existing and emerging implant applications across the medium current, high current and high energy space.  The scanned spot beam architecture used on all Purion products assures that customers can take full advantage of all current and future advanced process enabling implants, including materials modification techniques required in leading edge device processes. All Purion implanters incorporate Axcelis' industry leading contamination defense system for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance.  The common platform's proprietary dose and angle control system and constant focal length scanning deliver the most precise and repeatable dopant placement available today.  The Purion platform includes the Purion M medium current implanter, the Purion H high current implanter, and the Purion XE high energy implanter.

About Axcelis:
Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 35 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at www.axcelis.com.

CONTACTS:

Maureen Hart (editorial/media) 978.787.4266
Doug Lawson (investor relations) 978.787.9552

SOURCE Axcelis Technologies, Inc.



RELATED LINKS
http://www.axcelis.com

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