2014

Registration Open for the 57th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Premier Conference on the Science and Technology of Nanopatterning Takes on "Music City" with Engaging Speaker Lineup and New Resources for Students

NASHVILLE, Tenn., April 23, 2013 /PRNewswire-USNewswire/ -- Registration is open for the 57th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN), which brings together engineers and scientists from industries all over the world to discuss recent progress and future trends in nanofabrication, including nanoimprint and molecular self-assembly. The conference will feature an engaging speaker lineup with expert insight on the newest techniques and advances in patterning and device fabrication technology.

Celebrating its 57th year, this premier event will take place May 28-31 at the Gaylord Opryland Resort and Convention Center, in Nashville, Tenn. Plenary speakers include:

  • Luc Van den hove, president and CEO, imec
  • Jong Min Kim, professor of electrical engineering, University of Oxford
  • Molly Stevens, professor of biomedical materials and regenerative medicine, and research director for biomedical material sciences, Institute of Biomedical Engineering at Imperial College
  • Michael Roukes, Kavli Nanoscience Institute co-director, and professor of physics, applied physics, and bioengineering, California Institute of Technology

New to this year's event will be the EIPBN 2013 Mentorship Hour. The event, to be held on Wednesday, May 29, will give student and postdoc attendees a unique opportunity to learn essential skills and gain insight from senior members of the EIPBN community. The hour will consist of 10 minute, one-on-one sessions where mentors share personal and career experiences with attending mentees. All EIPBN members are eligible to act as mentors, and mentees are encouraged to bring their questions and resumes. The Mentorship Hour will also kick-start the 2013 student program, featuring a Virtual Job Fair and Student Breakfast.

"This year's symposium will bring together the brightest engineering and scientific minds from industries and universities worldwide to discuss the most pressing issues and trends facing nanoscale manufacturing," said Leonidas E. Ocola, 2013 EIPBN conference chair, and physicist at the Nanoscience and Technology Division, Argonnne National Laboratory. "The addition of the Mentorship Hour this year will also further strengthen the growth of the lithographic science and technology community, and is a demonstration of EIPBN's commitment to supporting students."

The conference has been endorsed by the following professional associations: American Physical Society (APS), The Optics Society of America (OSA), the American Vacuum Society (AVS) and the Institute of Electrical and Electronics Engineers (IEEE).

This year's conference sponsors include: ASML, Argonne National Laboratory, Hitachi, JEOL, Nanoscribe, Nikon, Oxford Instruments, Raith, STS-Elionix, Tescan, University of Louisville Micro/Nano Technology Center, Heidelberg Instruments, GenIsys, Carl Zeiss, and Vistec among other leading semiconductor tool manufacturers and research institutions.

For more information on sessions and program topics, or to register, please visit the 2013 EIPBN conference web page at: http://eipbn.org/. Registration is open through May 18, 2013.

About EIPBN

EIPBN, the "3-Beams", Conference is the premier conference on the science and technology of nanopatterning. Originally fabricated by either electron, ion, or photon beams ("the 3 beams"), the technology of nanoscale manufacturing now also includes nanoimprint technology, and engineering molecular structures that grow and replicate themselves. This conference is the place to hear the newest techniques and the latest advances.

SOURCE EIPBN



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