LONDON, Jan. 31, 2017 /PRNewswire/ -- Increasing demand for printed electronics is one of the prime factors which are anticipated to boost the market of semiconductor wafer cleaning equipment in the short, medium, and long term. Increasing demand for single wafer processing is expected to fuel the market in the emerging economies from 2016 to 2024. In addition, manufacturers of semiconductor devices are focusing on expanding their production units in different countries which in turn is considered to be a major driving factor for the Semiconductor Wafer Cleaning Equipment globally.
Single wafer processing is apt for minifab operations. The application of single wafer spin processing technology using hydrogen fluoride and ozonated water primarily accommodates a developer's shift to minifab operations, where shorter cycle times are possible. Increasing demand for single wafer processing is expected to fuel the market. Increasing application of semiconductor wafer cleaning equipment in production of various kinds of smart gadgets and smartphones, in-vehicle systems and a wide range of other electronic devices is one of the prime drivers for the market. Metallic contamination adversely affects semiconductor device performance, which in turn is fueling the application of wafer cleaning equipment across different industries globally. Growing concern for upgrading or improving product efficiency and production standard of semiconductor devices is boosting the demand for semiconductor wafer cleaning equipment. Growing demand for ICs, printed circuit boards (PCBs) other semiconductor equipment along with spurring demand for tablets and other semiconductor devices in developing economies, manufacturers of semiconductor devices are focusing on expanding production units in different countries which in a way is considered to be a major driving factor for the wafer cleaning equipment globally.
Global Semiconductor Wafer Cleaning Equipment: Scope of the Study
Based on product type, the market is segmented into single wafer processing systems, scrubbers and auto wet stations. In addition, by technology, the market is categorized into wet chemistry-based cleaning technology; etch cleaning technology and front side up wafer cleaning technology among others. Moreover, based on equipment type, the market is segmented into rotary wafer etching system and manual wet batch system. Furthermore, based on end use, the market is segmented into metallic contamination, chemical contamination, and particle contamination. Geographically, the global Semiconductor Wafer Cleaning Equipment market is categorized into Asia Pacific, North America, Europe, Latin America, Middle East and Africa. The market report offers the forecast of the market in terms of revenue (USD million) along with a broad study of the market.
Global Semiconductor Wafer Cleaning Equipment Market: Competitive Landscape
The key players in this market have been competitively profiled across the five broad geographic regions. This competitive landscape is inclusive of the various business strategies adopted by these major players and their recent developments in the field of semiconductor wafer cleaning equipment. Moreover, the report includes the patent analysis of semiconductor wafer cleaning equipment. Further, the report includes the market attractiveness analysis of different product, technology equipment types and end use of semiconductor wafer cleaning equipment and insight into the major end use area of the wafer processing equipment. A comprehensive analysis of the market dynamics of the global market that is inclusive of the driving factors, restraint and opportunities is covered under the scope of the research.
The companies involved in this market are focusing on extensive research and development along with acquisitions and mergers to strengthen its foothold in this market. Furthermore, strategic partnership agreement with other companies is also one of the prime business strategies adopted by the semiconductor wafer cleaning equipment companies across different regions globally. SCREEN Holdings Co., Ltd. (Japan), Modutek Corporation (The U.S.), Cleaning Technologies Group (The U.S.), Akrion Systems LLC (The U.S.), Lam Research Corporation (The U.S.), Speedline Technologies, Inc. (The U.S.), ONBoard Solutions Pty Ltd. (Australia), Falcon Process Systems (The U.S.), AP&S International GmbH (Germany), MEI Wet Processing Systems and Services LLC (The U.S.), Tokyo Electron Limited (Japan) among others are operating in the this market globally.
The semiconductor wafer cleaning equipment market has been segmented as follows:
Global Semiconductor Wafer Cleaning Equipment Market by Product Type
Auto Wet Stations
Single Wafer Processing Systems
Global Semiconductor Wafer Cleaning Equipment Market by Technology
Wet Chemistry Based Cleaning Technology
Etch Cleaning Technology
Front Side Up Cleaning Technology
Global Semiconductor Wafer Cleaning Equipment Market by Equipment Type
Rotary Wafer Etching System
Manual Wet Batch System
Global Semiconductor Wafer Cleaning Equipment Market by End Use
Global Semiconductor Wafer Cleaning Equipment Market by Region
Eastern Europe including Russia
Rest of Europe
Rest of APAC
Middle East and Africa
Rest of Middle East and Africa
Rest of Latin America
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