DUBLIN, October 10, 2017 /PRNewswire/ --
The "Annual Update for Senior Trade Mark & Design Administrators" conference has been added to Research and Markets' offering.
This conference is a must-attend event for all senior trade mark and design administrators. It will bring you up-to-date with the recent EUIPO legal reforms, focusing on changes to the law and practice, including a case law summary.
The EUIPO is constantly innovating and updating its online systems and tools, and you will get a tour through not only EUIPO but some of the linked databases. It will show you the differences between US and EU practice and what you should do about them. It will also highlight the pitfalls to be aware of in relation to trade marks in the US, as well as focussing on other country specific issues that you need to know about.
It will focus on common issues that can be encountered and how to deal with them to best effect. You will also learn about the international registrations of trade marks and designs under both the Madrid System and the Hague System and what future developments are planned that will affect you.
Key topics to be covered at this annual update:
- EUIPO legal reform
- Changes to current law and practice
- Office online databases, tools and projects - EUIPO, TMView, TMClass, Observatory
- EU and US practice differences and how to deal with them
- Foreign filing pitfalls and how to avoid them
- Country specific issues
- International registration of trade marks and designs - issues to avoid
- The Madrid and Hague Systems
- Latest developments and future plans
Why you should attend
This conference will give you a unique overview of this year's changes from the EUIPO and WIPO. It will inform you of latest developments and future plans that will affect you and how you work. The event also provides a networking opportunity for you to share your experiences with the other delegates and discuss answers to your questions. You'll acquire many take-home solutions that will save you time and money, and help you avoid costly mistakes.
Includes: Interactive sessions
Who should attend
- Senior trade mark administrators
- Formalities managers
- Senior design administrators
- IPR and legal assistants
- Paralegals
For more information about this conference visit https://www.researchandmarkets.com/research/sgxghw/annual_update_for
Media Contact:
Laura Wood, Senior Manager
[email protected]
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SOURCE Research and Markets
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